Used KLA / TENCOR CRS 1010 #9298930 for sale

KLA / TENCOR CRS 1010 is a mask and wafer inspection equipment from KLA, a leading supplier of measurement and inspection systems. This system harnesses the advanced capabilities of high-resolution imaging and intelligent metrology to provide users with comprehensive, accurate inspection and mask evaluation. KLA CRS 1010 is designed to meet the demands of the high-volume production environment and is capable of handing most wafers, from single-level masks to multi-level reverse-tone masks. At the heart of TENCOR CRS 1010 is its high-resolution imaging unit. The machine captures images of the mask and wafer at a resolution of up to 1.25µm and at various angles, ensuring accuracy in the inspection results. CRS 1010 uses patented E-beam and X-ray imaging technology to accurately measure the presence, absence, and layout of features in the mask and wafer. The tool is also capable of using either transmitted light or automated transmission imaging techniques to inspect for variations in the pattern layout. KLA / TENCOR CRS 1010 also includes sophisticated metrology capabilities, providing users with the ability to measure the width and length of features to within twenty percent or better of the design layout. The asset can detect the presence of pinholes, pits, and scratches on both the mask and wafer, and can identify and mark defects on the source code read-out. KLA CRS 1010 is designed to process both single-level and multi-level masks and wafers with accuracy and speed. The model is capable of interrogating as many as 32 layers of the mask concurrently, making it an ideal solution for high volume production requirements. In addition to its advanced imaging and metrology capabilities, TENCOR CRS 1010 provides users with an intuitive user interface and a number of features to facilitate data and information management. The equipment allows the user to store, view, and analyze information with an intuitive interface. The system can also generate detailed reports, which can be used to analyze the effectiveness of mask designs and revisions. In addition, the unit allows for the integration of external systems to facilitate data sharing and analysis of results. CRS 1010 is a powerful mask and wafer inspection machine developed by TENCOR to meet the demanding requirements of high-volume production environments. The tool provides users with advanced imaging and metrology capabilities that ensure accuracy and speed in the inspection process. Furthermore, the intuitive interface and features make it easy to store, view, and analyze information, making it an ideal solution for any mask and wafer evaluation needs.