Used KLA / TENCOR CRS 1010 #9382222 for sale
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ID: 9382222
Vintage: 1997
Confocal review station
Power supply: 208 V, 50/60 Hz, Single phase, 20 Amps
1997 vintage.
KLA / TENCOR CRS 1010 mask and wafer inspection equipment is an automated optical inspection platform best suited for semiconductor fabrication processes. The system is based on advanced confocal imaging technology with a laser, allowing for fast, highly accurate imaging of tiny structures on mask and wafer substrates. KLA CRS 1010 is equipped with a two-megapixel CMOS camera and a high-power laser which are both used to capture and inspection images at very high magnifications. The laser is calibrated to generate an optimal amount of light while focusing on a preset resolution. The laser is individually tracked and monitored by the unit to ensure it is running correctly and does not exceed safety standards. TENCOR CRS 1010 is capable of performing defect inspection, contaminant detection, and particle analysis on a single wafer. The machine is equipped with pattern recognition and classification algorithms which can be used to quickly and accurately identify and classify defects. The tool also has integrated software that can be used to adjust inspection parameters and thresholds for true positive/negative classification and data analysis during the mask/wafer inspection process. CRS 1010 also includes its own data storage and communication solutions, making it capable of serving as the hub for the entire mask/wafer inspection process. It is capable of integrating seamlessly into existing operations and infrastructures, as well as having its own software library of inspection algorithms and apparatus. KLA / TENCOR CRS 1010 has an intuitive user interface, making it easy to program and utilize. It is also designed to be adaptable to many different operating environments, and has a comprehensive metrology package as well. This improves its flexibility and overall usability, allowing it to be quickly adapted for multiple applications. Finally, KLA CRS 1010 has an incredibly low False Call rate and contributes greatly to improving production yields. By removing potential human error, the asset provides greater uniformity in operations and defects down to Angstrom levels can be detected and corrected. As a result, TENCOR CRS 1010 is a powerful and reliable tool for mask and wafer inspection processes.
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