Used KLA / TENCOR CRS 2000 #293627297 for sale

KLA / TENCOR CRS 2000 is a mask and wafer inspection equipment designed to detect critical defects in advanced semiconductor manufacturing processes. It leverages the strength of high resolution optical metrology and expert defect recognition algorithms to accurately detect and classify defects down to the sub-micron level. This robust, full-featured system is capable of sensing both top and bottom geometry on every wafer and mask, while applying a range of software-defined process customizations to ensure maximum defect coverage and accuracy. The unit includes an advanced wafer monitoring software package that enables users to monitor, analyze, and predict wafer levels and layer integrity throughout their production process. The machine comes with advanced imaging hardware modules that can detect and measure defects in the sub-micron range, enabling users to detect non-visible defects that are typically missed. Additionally, it can also detect defects and anomalies in multiple layers of the same wafer, as well as any defects that may occur in surrounding areas. KLA CRS 2000 uses a library of known defect areas with customizable parameters to detect even the most subtle forms of defects. Additionally, it uses powerful analysis tools to capture images, display them in real time, and compare and contrast each image within the inspection process. TENCOR CRS 2000 also features an integrated laser tool that quickly provides alignment and mask registration of multiple chips, ensuring consistent defect detection and repeatability. Finally, CRS 2000 offers a range of automation solutions to streamline processes and improve throughput and profitability. The asset can detect defects automatically, reducing manual inspection time, and adjusts the illumination and model settings for each wafer to reduce false defect rates and allow for reliable, repeatable results. In summary, KLA / TENCOR CRS 2000 is a powerful and advanced mask and wafer inspection equipment that can meet the stringent requirements of modern semiconductor manufacturing processes. It leverages the power of high resolution imaging capabilities, expert defect recognition algorithms, and automation solutions to provide users with accurate results, repeatability, and improved throughput.