Used KLA / TENCOR CRS 3100 #9207492 for sale
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ID: 9207492
Vintage: 2002
Review station
Power supply: 1 Phase, 24 A, 220 VAC, 60 Hz
Maximum ampere: 10000
Maximum load: 12
2002 vintage.
KLA / TENCOR CRS 3100 Mask & Wafer Inspection Equipment provides a high-performance solution to inspect and analyze high-throughput production lines of semiconductor wafers. This automated inspection system utilizes high-sensitivity imaging technology to identify micro-defects on the wafer surfaces with extremely high accuracy and clarity. In addition, KLA CRS 3100 unit also allows for sophisticated in-die review and analysis to detect isolated micro-defects that are hidden within the wafer disks. At the heart of TENCOR CRS 3100 machine is a specialized optical assembly that provides highly sensitive all-reflection imaging of the wafer disk, and a CCD camera that captures multiple images of the wafer surface in sequential capture mode. CRS 3100 tool is also flexible on the type of wafer that can be inspected, as it can support both slicon and gallium arsenide wafer disks with equally high precision and accuracy. This product also includes an advanced, 6-axis gimbal positioning asset with a resolution of 1.5 microns, allowing for highly precise alignment of the wafer on the optical stage. KLA / TENCOR CRS 3100 model is also capable of inspecting wafer disks with optical fault detection (OFD) to identify defects on the top surface of the wafer. This OFD module utilizes unique advanced sensing techniques to optimize and improve defect detection sensitivity and detect even minute defects. Further, the equipment also features an Auto FE-SEM sampling system, which uses electron microscopy techniques to electrochemically etch damaged layers on the surface of a wafer for further defect analysis. Finally, KLA CRS 3100 unit is designed to maximize throughput of the wafer disk inspection process. It is equipped with an advanced user interface that makes it easy to set up and enter inspection parameters, providing comprehensive and custom-defined inspection recipes. In addition, the machine also offers very low downtime, allowing the user to quickly and efficiently adjust inspection parameters and optimize it for maximum accuracy and speed. With these innovative features and advanced specifications, TENCOR CRS 3100 Mask & Wafer Inspection Tool is positioned as one of the top solutions for advanced semiconductor wafer inspection.
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