Used KLA / TENCOR CV300 #9244817 for sale

KLA / TENCOR CV300 is a highly advanced mask & wafer inspection equipment that provides high-quality semiconductor process control and leading-edge optical inspection technology. The system's multi-stage inspection process enables it to inspect wafers at a cycle time of less than a second, allowing it to quickly detect and diagnose defects. Its inspection technology is ideal for CMOS process control, as it is capable of detecting and evaluating features at multiple scales, from nanometer to sub-micron and beyond. KLA CV300's optical inspection unit is an integral part of its process control suite, featuring a multi-spectral imaging machine, high-magnification optics, and automated defect classification based on image-analysis algorithms for maximum defect resolution. The tool also utilizes advanced KLA particle inspection technology to analyze particle sizes from 100 µm down to 20 nm. Additionally, it includes features such as overlay measurement, die-level metrology, and surface defect scans, all of which can be used to further improve defect detection and analysis. TENCOR CV300 also boasts an array of advanced asset features, such as an auto-calibration process, a user-friendly interface, comprehensive measurement reporting, and efficient data management tools. It includes software for display and control of process data, along with tools for critical defect device matching, data analysis, and process optimization. The mask & wafer inspection model is designed for maximum modularity, allowing for a range of configuration options to meet specific process needs. Its user-friendly features and robust design make it highly reliable, while its high-precision optical and particle-detection mechanisms enable superior wafer and die-level inspection down to the sub-micron scale. In summary, CV300 mask & wafer inspection equipment is an all-in-one solution for process control and inspection. With its advanced optics, particle-detection, and multi-scale inspection capabilities, it is designed to simplify process control and reduce process steps while maintaining the highest quality standards of accuracy and speed.