Used KLA / TENCOR DFIMS Handler for SP1 #9262063 for sale

KLA / TENCOR DFIMS Handler for SP1 is a state-of-the-art mask and wafer inspection equipment that has been designed to meet the most demanding requirements for today's most advanced semiconductor materials and processes. The system is comprised of many technologies designed to achieve maximum performance levels in terms of defect detection and prevention. It provides automated mask and wafer inspection, particle detection, and defect confirmation capabilities. At its core, KLA DFIMS Handler for SP1 utilizes a set of powerful image processing and microscopy technologies to inspect masks and wafers for surface defects. It employs an advanced optical unit which is enhanced with a deep ultraviolet laser to perform high-resolution, large-area imaging, pattern matching, defect analysis, and statistical documentation. Using these methods the machine can identify defects very quickly and accurately with its highly precise defect localization capability. The tool also utilizes a unique auto-focus feature which ensures that inspection images are taken at the optimum focal plane for maximum performance of the asset's inspection capabilities. This ensures the highest accuracy and shortest inspection time. A specialized Auto-Threshold feature is also included which can accurately identify particles and other small defects on the mask or wafer surface. In addition to its image processing capabilities, TENCOR DFIMS Handler for SP1 also comes equipped with an advanced defect classification model. This equipment is used to provide real-time classification and prioritization of detected defects with regards to their risk level. This allows the system to determine the most appropriate resolution and response for each detected defect. It also greatly simplifies the mask and wafer inspection process by automatically identifying the most appropriate resolutions to the detected defects without any user intervention. Overall, DFIMS Handler for SP1 offers a powerful, highly precise solution for inspecting masks and wafers for surface defects. It combines advanced image processing technologies and specialized defect classification capabilities to provide the utmost in accuracy, reliability, and speed. As such, it is a great choice for semiconductor device manufacturers looking for a reliable, cost-effective, and accurate solution for mask and wafer inspection.