Used KLA / TENCOR eDR-5200 #9161799 for sale

KLA / TENCOR eDR-5200 is a next-generation automated mask and wafer inspection equipment built to meet the most stringent requirements. It offers unprecedented performance along with high speeds and exceptional accuracy. The system's main features include a large field of view, an efficient imaging path, and a highly advanced beam scanning unit. KLA eDR-5200 has a large Image Field of View (FOV) of up to 9000 x 9000 microns. This extended FOV allows a great deal of area coverage for wafer and mask inspection with minimal time and effort. Coupled with built-in optics, imaging technologies, and advanced illumination, this machine is capable of producing images of superior quality. In addition, the tool features a streamlined imaging path which provides optimum image clarity and quality. With the image sensor and analytic technologies, the asset is able to detect defects in sophisticated patterns and shapes, such as even small scratches, contaminants, protrusions, and other substrate irregularities. Moreover, the model incorporates a highly advanced beam scanning equipment which is tailored to meet the specific requirements of the masks and wafers being inspected. TENCOR eDR-5200 is designed for rapid and reliable performance, and its beam scanning system is capable of scanning an entire 4" wafer in under 30 minutes. EDR-5200 is an advanced tool for inspection of masks and wafers. It has a large FOV, a streamlined imaging path, and a sophisticated beam scanning unit, all of which enable it to perform the most complex inspection tasks, with incredible speed and accuracy. As the development of semiconductor fabrication equipment continues, KLA / TENCOR eDR-5200 will remain a reliable and powerful tool for mask and wafer inspection.