Used KLA / TENCOR eDR-5210 #293755073 for sale

KLA / TENCOR eDR-5210 is a mask and wafer inspection equipment that utilizes 3D coherent illumination technology for high-precision defect detection. This system is designed to be used in a semiconductor manufacturing environment and provides a wide range of inspection capabilities. It is suitable for both leading-edge and legacy devices, and can be used for both production and research purposes. The unit is composed of a 13 megapixel patterned color CCD camera that is fitted with a large format lens. This captures images of the located device and transmits them to the main control unit. The machine has a user-friendly graphical interface and intuitive setup options that allow an operator to quickly adjust parameters for defect inspection and measurement. It also provides powerful automated features for image calibration and measurement, as well as defect classification. KLA eDR-5210 is equipped with integrated 3D coherent illumination tool. This feature utilizes patented "MODLESS" scanning technology which is designed to significantly improve defect detection and analysis capabilities. Furthermore, the asset is capable of simultaneously capturing phase and dark images while maintaining consistent illumination level. The model is also equipped with a comprehensive set of defect classification algorithms to ensure accuracy. This includes surface defect classification algorithms, imaging contrast enhancement techniques, automated characteristics tracking and evaluation, brightness enhancement strategies, and sub-resolution feature analysis. Additionally, each defect image is provided with an assigned defect category and defect severity. Finally, TENCOR EDR 5210 equipment offers excellent flexibility and scalability. It can be easily configured to address different types of tasks and can be adapted to custom solution needs. Furthermore, it can be integrated with other software systems for data management, reporting, and defect analysis. Overall, TENCOR eDR-5210 is an advanced and highly accurate mask and wafer inspection system. It utilizes 3D coherent illumination and patented MODLESS scanning technologies, offering superior defect detection precision and reliability. Additionally, the unit provides a comprehensive defect classification analysis machine and excellent flexibility and scalability. This makes it a great choice for both production and research in the semiconductor industry.