Used KLA / TENCOR eDR-5210 #293755074 for sale

KLA / TENCOR eDR-5210 is a mask and wafer inspection equipment designed for high-precision analysis of photomasks, measuring features as small as 0.08 microns. The system is capable of inspecting both reticles and wafers simultaneously, and it utilizes advanced optical techniques, such as scatterometry and optical microscopy, to detect and identify particles - even those less than one micron in size. The fiber optic-based unit is able to generate extremely detailed images of masks, even at small magnifications. In addition, it can generate high-resolution scatterometry measurements of critical patterns, such as trenches, vias, and spacings. The machine is also capable of performing defect inspections on processed wafers, helping the user to identify and quantify both surface and in-depth defects. KLA eDR-5210 is also capable of analyzing different types of materials, ranging from quartz through to silicon, and can accurately perform 4x reticle defect detection for both large and fine-pitch masks. The tool includes advanced software that can quickly and efficiently inspect and measure large datasets, as well as facilitate automatic defect analysis. The asset boasts several key features, including a high-speed scan mirror, precision process control, a spectrograph optical model, and a reliable 10kHz laser equipment. Together, these components enable the machine to produce accurate images, measure defects with greater resolution than conventional methods, and quickly identify and diagnose potential mistakes. Overall, TENCOR EDR 5210 is a powerful, high-performance mask and wafer inspection system that is well suited for a variety of semiconductor production applications. By combining advanced optical techniques with robust software, the machine can accurately detect and report on the smallest of defects, making it an essential tool for efficient and error-free manufacturing.