Used KLA / TENCOR eDR-5210 #9112888 for sale

KLA / TENCOR eDR-5210 is a mask and wafer inspection equipment, designed to detect defects and anomalies in photomasks and wafers. The system is comprised of three main components: the eDR-5000 scanner, the eDR-5400 wafer inspection stage, and the advanced K3 imaging unit. The eDR-5000 scanner is the heart of the machine and provides the high resolution imaging needed to capture each defect. It utilizes high-precision optics and highly sensitive cameras to capture full-focal-plane images of defects on both positive and negative photomasks. The scanner has a modular design that is easily modified to accommodate the variety of mask sizes and types available. The eDR-5400 wafer inspection stage is an automated tool that allows the scanner to process multiple wafers simultaneously, up to 24 at a time. It is designed to recognize the size, type, and orientation of wafers for easy wafer loading. Additionally, its high throughput allows for the automatic capturing of images on every wafer, which ensures complete coverage for both patterned and unpatterned wafers. Finally, the K3 imaging asset is the component of the model that analyzes and identifies defects on the wafers. This advanced imaging equipment is capable of processing large datasets quickly and accurately to detect various types of defects, including particles, voids, line edge and line width variations, missing features, and other discrepancies. It also has the ability to distinguish between similar features to reduce the potential for misidentification. KLA eDR-5210 system is designed to provide high-resolution imaging and rapid analysis of photomask and wafer defects. Its modular design and automated stage allow the unit to quickly process up to 24 wafers at a time. The machine's advanced imaging tool is capable of accurately and rapidly detecting various types of defects, ensuring reliable results and increasing production efficiency.