Used KLA / TENCOR eDR-5210 #9278890 for sale

KLA / TENCOR eDR-5210 is a mask and wafer inspection equipment designed for inspecting advanced semiconductor devices as they move through production. This system provides versatile inspection capabilities combined with advanced imaging and analysis technology to ensure that features, defects, and other characteristics of a device are properly measured. The unit has a dual-axis wafer stage that can accommodate most industry size requirements for uniform wafer topography. It also boasts a 4x4" M2.5 Field of View with a 0.55 µm × 0.55 µm pixel size. The machine uses High Accuracy Defect Location (HADL) technology, a high-resolution, high-precision imaging technology that can detect defects smaller than 0.3 µm across a 360 degree field of view. The tool also includes an Intelligent Scan Pattern Algorithm (ISPA) for improved uniformity. ISPA is designed to automatically detects defects and enforce specific defect limits based on process variables and material compositions, batch process parameters, and specification settings. In addition, the asset offers proprietary intelligent surface analysis (ISA) tools, including unique particle identification (UPI) technology, to detect and characterize particles, linewidths, and voids. The model employs the latest imaging and illumination technologies, which include LED-based 3D illumination, LED-based multi-plane illumination, a variable spot size (VSS) mode for searchless defect detection, and laser reflectometry for improved edge contrast. It also offers a powerful 16-bit image processor with real-time digital image processing to quickly compute defect and particle information. Finally, KLA eDR-5210 offers a choice of three software packages: KLA Desktop Explorer, AOI Express software, and AOI Integrated software. These packages provide features such as real-time data analysis, custom report generation, analysis and monitoring, wafer and die mapping, and particle and defect tracking. Additionally, the equipment offers advanced data export capabilities, enabling customers to export data to a variety of external measurement and analysis tools. TENCOR EDR 5210 is an advanced, versatile mask and wafer inspection system that offers industry-leading image and analysis capabilities. With its state-of-the-art illumination, imaging, and analysis technologies, customers can trust that its inspection results are reliable and accurate. The unit provides the benefit of increased data accuracy and comprehensive defect detection and analysis for a wide variety of advanced semiconductor devices and integrated circuits.