Used KLA / TENCOR eDR-5210 #9397336 for sale

KLA / TENCOR eDR-5210 mask and wafer inspection equipment is an advanced metrology platform designed to provide high-resolution defect detection and in-depth analysis of advanced photomask and wafer patterns. It is a multi-mode system capable of working in both bright-field and dark-field illuminations, enabling imaging with high contrast and using standard commercial darkfield, ringfield, and linear polarizing modes. Dedicated algorithmic functions further facilitate seamless defect detection and analysis of photomask, reticle, and wafer patterns. The unit features a 50 cm maximum field size with 0.05 µm imaging resolution and a 1 µm inspection step size, making it one of the highest resolution systems on the market. It is equipped with active auto-focusing capabilities, an auto-stage machine, advanced illumination systems and auto-mask retrieval and handling capabilities. Additionally, the tool boasts of an advanced CMOS imaging detector, ensuring faster operation and improved shot noise performance. KLA eDR-5210 also encompasses powerful advanced AI-based algorithms that help analyze images in order to detect different kinds of defects. Additionally, the asset also offers a wide range of advanced analysis and reporting tools that enable users to quickly and easily visualize and document defect data. Overall, TENCOR EDR 5210 mask and wafer inspection model offers a comprehensive solution for inspecting photomask and wafer patterns. Its combination of powerful algorithms and advanced imaging resolution ensures a robust and reliable equipment for defect detection and analysis.