Used KLA / TENCOR eDR-5210S #9269303 for sale

KLA / TENCOR eDR-5210S is a fully automated mask and wafer inspection equipment designed for high-throughput metrology applications. KLA eDR-5210S offers superior optical performance and automated defect detection for inspection of masks and wafers. The system can inspect patterns down to 3.5 nanometers in size with image resolutions up to 20 megapixels. The unit features an automated multi-stage lens machine that provides a large field of view and a very high numerical aperture. This allows for a high level of accuracy and resolution when inspecting masks and wafers for defects. TENCOR eDR-5210S utilizes a 600W high-intensity LED light source with an adjustable light wavelength from 250nm to 1750nm for detecting defects. The tool uses multiple simultaneous exposures and advanced image processing algorithms to detect defects even at very low light levels. The automated inspection process includes mask and wafer positioning, optical measurement, image processing, and data analysis, reducing the overall time needed for inspection. EDR-5210S is designed to perform fast and reliable inspections, even at low signal to noise levels. Image processing algorithms such as pattern recognition and Q-factor inspection, combined with the powerful lighting capabilities, enables the asset to rapidly detect sub-micron defects and other imperfections on masks and wafers. The model also features a user-friendly GUI with an intuitive interface for easy setup and operation. KLA / TENCOR eDR-5210S is a versatile inspection equipment designed to provide high-throughput metrology to ensure defect free masks and wafers. The system can detect defects down to 3.5 nanometers with very high resolution and accuracy. The automated inspection process coupled with advanced image processing algorithms and powerful lighting capabilities allow for rapid and reliable defect detection. The user-friendly GUI interface makes the setup and operation of the unit easy and straightforward.