Used KLA / TENCOR eDR-5210S #9390422 for sale
URL successfully copied!
KLA / TENCOR eDR-5210S is a leading-edge mask and wafer inspection equipment. KLA eDR-5210S is designed for both mask and wafer fabrication, providing a comprehensive solution for the detection of defects. TENCOR eDR-5210S employs state-of-the-art image technology to detect subtle, complex defects on a variety of photomasks and wafers. EDR-5210S incorporates a high-resolution, high-definition B&W CCD camera, with a telecentric optics system providing an aperture of over 400 microns. A custom image-processing algorithmology combined with a powerful embedded computer allows for ultra-fast processing of images. The image processing capabilities of KLA / TENCOR eDR-5210S also allow it to identify complex patterns such as bridging, critical dimension (CD) errors, pattern shifts, and misalignment among others. KLA eDR-5210S has been designed using an open architecture for flexible integration into any existing or planned test platform. The unit has full compatibility with both 25mm and 30mm masks, and wafers with various substrates. TENCOR eDR-5210S also has the ability to interface with third-party software and hardware. The machine utilizes state-of-the-art micro-erosion technology, enabling it to detect minute defects with a resolution of 2 microns. In addition to defect-detection, eDR-5210S also provides a comprehensive wafer quality assessment, measuring uniformity, surface roughness, line-width, and pattern integrity. The advanced programming capabilities of the tool include a graphical user interface (GUI) with an intuitive menu structure to create and modify inspection scripts, and menus designed to quickly outline potential defects. The asset also has the ability to store image data for future use. KLA / TENCOR eDR-5210S also supports a wide range of test protocols, including mask etching, X-Ray imaging, and surface scanning. KLA eDR-5210S is ideal for mask fabrication and wafer inspection, providing the most sophisticated and versatile inspection model on the market. With its advanced image processing capabilities, high-resolution camera, and flexible programming, TENCOR eDR-5210S can ensure accurate and reliable detection of both mask and wafer defects.
There are no reviews yet