Used KLA / TENCOR EFEM #9276613 for sale

KLA / TENCOR EFEM is a mask and wafer inspection equipment designed to enhance the accuracy and efficiency of quality assessment. Specifically, the system simplifies the process of verifying the integrity and uniformity of semiconductor wafers and masks by utilizing custom algorithms that detect wafer defects in real-time. The unit employs both automated and manual inspection capabilities including area yield analysis, precision counting, planarity, and uniformity checks, enabling users to quickly identify and address any defects. KLA EFEM also provides advanced defect classification capabilities. This feature allows the machine to simultaneously inspect multiple masks on a wafer and classify up to 25 different defect type classes. TENCOR EFEM also provides powerful metrology capabilities. Using a high-resolution imaging tool, the asset is capable of measuring line widths and CD differences with an accuracy of 5nm and detect small particles of 2.5um and below. It also features multi-sampling algorithms to check defect line edge roughness and bridge/island sizes. EFEM is capable of inspecting a variety of formats, including multi-layer masks and substrates, different types of reticles, and various packaging requirements. With its high-resolution imaging model, the equipment can detect geometry errors such as stitching and lithography biases, as well as errors in deposition patterns and materials. Additionally, the system can perform optical inspection, such as diffraction testing, for resolution checks. Furthermore, KLA / TENCOR EFEM has an open platform and is compatible with Windows, Linux, and Mac OS operating systems. Overall, KLA EFEM is a powerful and versatile tool for mask and wafer inspection, providing robust automated and manual inspection capabilities with advanced metrology features to ensure accuracy and efficiency.