Used KLA / TENCOR EFEM #9276743 for sale

KLA / TENCOR EFEM is a mask and wafer inspection equipment designed to handle production inspection requirements for photosensitive quartz masks used in semiconductor device fabrication. It utilizes proprietary advanced inspection technologies such as bright field, dark field, and Digital Path Difference (DPD) imaging to identify defects such as particles and foreign materials on the mask and wafer, allowing for accurate measurements of subtle differences between the two. KLA EFEM system can be configured with visible to near-UV light sources and a range of optical interfaces such as objectives, magnifiers, pinholes, and fiducial markers, allowing it to inspect masks and wafers up to 25 cm in diameter with a fine resolution. It also includes defect recognition and defect marking capabilities, which enable quick defect evaluation and analysis. Furthermore, the unit includes a flexible software package which can be adapted to perform a variety of tasks, such as selection of optimum inspection brightness, automatic focusing, and display of defect images. TENCOR EFEM machine is designed to keep costs down while providing a high degree of accuracy. Its inspection capabilities are further enhanced through the use of multiple technologies, combined with a high-speed optical spectrometer for capturing size, shape, and position information for each individual defect. In addition, it can be configured with an automated tool which is capable of further processing defect data to separate false and real defects, allowing for the most effective flow of production data. EFEM provides die-to-die inspection capabilities, a versatile and user-friendly asset, and advanced image-processing features that enable automated analysis of defects down to the finest details. It is able to perform inspections on both single-wafer and double-sided wafers, and can be configured with a broad range of special calibrations and calibration field sizes. The model is also capable of integrations with other manufacturing equipment such as etching and metrology systems, allowing for automated comparison and defect recognition. Overall, KLA / TENCOR EFEM is an advanced mask and wafer inspection equipment designed to provide high-accuracy results with minimal cost and effort. It is capable of inspecting a variety of quartz masks and wafers up to 25 cm in diameter, and offers a range of built-in automated features for quick analysis of defects.