Used KLA / TENCOR EFEM #9278728 for sale

KLA / TENCOR EFEM is a mask and wafer inspection equipment, designed to detect defects on critical layers of the mask and wafer. The system is based on the Electron-Beam Freeform Inspection Method, or KLA EFEM. TENCOR EFEM is an innovative approach to wafer and mask inspection that requires no optical projection during the inspection process. Instead, it uses a focused beam of electrons to inspect the mask and wafer. This electron beam has a wide range of ability to distinguish different types of defects. EFEM unit consists of several components. The machine includes the electron-beam source, the optics, the signal detection and analysis tool, and the asset control board. The electron beam source is designed to generate a beam of high-energy electrons with a focused beam profile. This beam is then directed to a specific point on the mask or wafer, which allows the focused electron beam to examine the specific features on the mask or wafer. The optics consist of a set of lenses that focus the beam onto the mask or wafer, allowing for precise imaging of the features. The signal detection and analysis model is responsible for interpreting the images produced by the electron beam, allowing it to detect the presence of mask or wafer defects. The control board is the brain of the equipment. It allows the electron beam to be precisely directed to the specific features on the mask or wafer by controlling the electron beam deflection, beam rate, and other parameter settings. The control board also provides the interface between the system and its operator. KLA / TENCOR EFEM unit has proven to be very reliable in mask and wafer inspection. It enables high-resolution capability in a non-contact and non-destructive manner. Furthermore, it offers excellent defect detection capabilities with its ability to distinguish different types of defects. KLA machine has become a popular choice for many semiconductor fabrication facilities, delivering reliable inspection results and improving quality control.