Used KLA / TENCOR es20 #9145312 for sale

KLA / TENCOR es20
ID: 9145312
Wafer Size: 8"
E-beam defect inspection system, 8" Detection of yield-limiting defect types Sub- 0.18-micron technologies and copper interconnect processes Detects sub-design rule particles and patterning defects Detects defects in very high aspect ratio structures Detects electrical defects such as voids.
KLA / TENCOR es20 is a mask and wafer inspection system built to meet the stringent requirements of the semiconductor industry. Combining advanced imaging, automated defect detection, automated review, and extensive engineering expertise, KLA es20 delivers superior results. The imaging component of TENCOR es20 provides high resolution images of siles in a single scan, reducing scan time and sample volume. Images are captured with a 5 Megapixel VARMITouch digital camera and advanced optical elements, including a bank of 4 lighting sources and a precision Xenon strobe. This ensures that siles are accurately detected, measured, and analyzed. The automated defect detection component of es20 is powered by advanced AOI and SEM algorithms. Calibration data allows the system to automatically detect a wide range of defects, including particles, point defects, line defects, and fractal defects. KLA / TENCOR es20 also has the ability to detect low contrast patterns, such as those found etched into 1-2 μm layer thicknesses. The automated review component of KLA es20 leverages the defect data retrieved by the imaging and defect detection technologies. TENCOR es20's AI-powered integration of image processing and context-sensitive defect classifiers ensure accurate automated review of chips and dies. This reduces time spent on manual review, so samples can be processed faster and more efficiently. The engineering team of es20 is committed to providing comprehensive support to our customers. Their expertise extends beyond the algorithms expediting wafer inspection - the team also provides guidance optimized to customer fabs and technology nodes, as well as tailored knowledge training, to ensure the maximum results from KLA / TENCOR es20. KLA es20 is an advanced mask and wafer inspection system, providing our customers with the highest accuracy for wafer inspection. Its 5 Megapixel digital camera, lighting sources, AOI and SEM algorithms, automated review, engineering expertise, and comprehensive support, ensure that results are both optimized and repeatable.
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