Used KLA / TENCOR es20xp #188080 for sale

KLA / TENCOR es20xp is a state-of-the-art mask and wafer inspection equipment. It is a modularized system that can be configured for a variety of operation modes to inspect multiple types of masks and wafers. It utilizes advanced algorithms and hardware for high-speed metrology inspections to increase throughput and provide highly reliable and accurate results. The unit comprises of a scanner head module, optics, a measurement machine and a software control tool. The scanner head module is equipped with a deflection pupil or telecentric optics allowing angular and planar imaging field of view. The optics and measurement asset is automated and uses serial measurements. It includes an image intensifier and photometric detector for inspecting weak signals for masks and wafers. The inspection fields are complemented by a stroboscopic illumination model and color filter to avoid image washouts. The software control equipment supports multiple features including inspector coding, multi-image sampling and fast image processing. It has an asynchronous design, allowing individual images to be processed in parallel. The advanced algorithms provide real-time feedback and defect detection, allowing for rapid classification and improved accuracy. The enhanced dynamic range in the system allows it to detect subtle defects in wafers and masks. The parallel signal and image processor helps to achieve high speeds when performing inspection operations. The unit holds precision and repeatability when scanning within very small sizes, enabling inspection of designs ranging from 0.5 microns to 25 microns in size. KLA ES20 XP is equipped with an event record module capable of capturing and recording image frames for reporting. The user-friendly software has multi-language support and uses applications optimized to allow the machine to be tailor-made for various processes or applications. TENCOR ES 20 XP is built for highly reliable and accurate results and can be customized to meet one's specific requirements and applications. It is capable of detecting and classifying defects resulting from exposure issues, lithographic processing parameters, overlay errors and more, making it an all-in-one tool for mask and wafer inspection.