Used KLA / TENCOR es20xp #293592548 for sale
URL successfully copied!
Tap to zoom
ID: 293592548
E-Beam inspection system, parts machine
Chamber
Robot
(2) Load ports missing.
KLA / TENCOR es20xp is a high performance Mask and Wafer inspection equipment specifically designed to meet the stringent mask and wafer defect detection requirements of today's optical lithography industry. KLA ES20 XP provides highly efficient, cost effective, and accurate defect review while speeding up the wafer fabrication process and shortening the time to market. TENCOR ES 20 XP utilizes a unique triple axis scanning system to accurately detect and analyze microscopic defects that can cause defects in the device or yield. TENCOR es20xp uses a patented GENII Imaging Unit to perform both brightfield and darkfield imaging of the mask or wafer. This imaging machine allows for greater resolution and increased sensitivity for defect detection. ES20 XP also offers a number of advanced features, including variable slit size, variable field of view, variable focus, and variable contrast for the most complete mask and wafer defect inspection. KLA es20xp utilizes a patented automated defect classification tool to identify and classify defects. Defects are categorized according to size, shape, location, orientation, and composition. In addition, es20xp can also detect process bridging, line bridging, and open defects in order to provide the most comprehensive view of defects in the device or wafer. ES 20 XP distinguishes itself from other systems by its high throughput, with scan rates up to 200 scanning lines per second. In addition, KLA / TENCOR ES20 XP is extremely reliable and accurate, with repeatable measurement accuracy of up to 1.5 microns when measuring critical defect sizes on masks or wafers. In addition to the amazing inspection capabilities, KLA / TENCOR ES 20 XP offers a user-friendly and easy to use Human Machine Interface (HMI) that provides complete control over TENCOR ES20 XP operation. The user-friendly HMI allows users to quickly and easily set up the asset, review data, and report results. The built-in statistical analysis and reporting functions allow for easy review and analysis of data. KLA ES 20 XP provides advanced productivity solutions for mask and wafer inspection and defect review. The high quality and accuracy combined with the reliability of the inspection model results in improved yields and reduced process downtime, resulting in faster time to market for device manufacturers.
There are no reviews yet