Used KLA / TENCOR es20xp #9137120 for sale
URL successfully copied!
Tap to zoom
ID: 9137120
Inspection scanning electron microscope (SEM),
KLA-Tencor 730-611879-001, Rev. AA
KLA-Tencor 750-611512-001, Rev. AA
KLA-Tencor 450-606043-00
Kensington A00-1464
Kensington A00-1465
(2) Warner Electric Motor M061-LSOSE
MDC ABLM-133-1 S/L.
KLA / TENCOR es20xp is an advanced mask and wafer inspection equipment designed to detect defects and process control issues in semiconductor production. The system uses top-of-the-line, high-resolution hardware and advanced software algorithms to inspect semiconductor masks and wafers at high speed and accuracy. Its components include a hardware inspection unit, a computer-assisted inspection machine (CAI), and an operator interface. The hardware tool provides two main functions: imaging and defect inspection. The first step of the asset is imaging, which captures a high-resolution picture of the wafer or mask. This picture is then used to create a pattern of features that are identified and compared with the desired feature set. If any defects are found, the model replicates the defect on an image for further analysis. The second step of the equipment is defect inspection. The inspection process typically consists of two additional steps. First, the system conducts a surface scan and then looks for anomalies in the wafer or mask pattern. Once discrepancies are identified, the unit marks these as defects and further evaluates their severity. The CAI provides the ability to store inspection programs, automate recurring tasks, and analyze data. This machine is designed to reduce the time it takes to complete an inspection and to increase accuracy and specificity. Its components include pattern search/match algorithms, statistical process control software, and database integration tools. Lastly, the operator interface is designed for easy maneuverability and enhanced usability. This interface allows the user to quickly program the tool, review the images, and verify inspection results. It also allows the asset to be optimized for a particular application or inspection goal. In conclusion, KLA ES20 XP model is a sophisticated and efficient mask and wafer inspection equipment with multiple components. With its high resolution hardware, advanced software algorithms, and user-friendly interface, the system is capable of accurately and quickly detecting defects and controlling processes in the semiconductor manufacturing process.
There are no reviews yet