Used KLA / TENCOR eS25 #9249429 for sale

KLA / TENCOR eS25 is an innovative wafer and mask inspection equipment designed to identify, monitor and analyze critical defect data and particle contamination on semiconductor wafers and photomasks. The system consists of two components: a charge coupled device (CCD) wafer inspection unit and a quadrapole scatter resource imaging (QSRI) mask inspection machine. The CCD wafer inspection tool utilizes highly sensitive light detectors to detect very small defects and particles on a wafer. The asset includes a custom-designed and integrated camera featuring color CCD imaging and high precision optics. The integrated camera can apply sophisticated algorithms to inspect particles and other defects on wafers and eliminate false positives. Additionally, the model includes a particle recognition equipment that can detect and accurately characterize particle shapes and sizes. The QSRI mask inspection system also uses advanced imaging technology to detect defects on photomasks. This unit utilizes a quadrapole scatterometer with high speed scanning capabilities to generate high quality images of photomasks quickly. Additionally, the machine has a proprietary analysis algorithm that can measure the size, shape and contrast of particle defects on photomasks. The tool is capable of detecting particles down to 25 nanometers in size. KLA eS25 is an advanced inspection asset designed to ensure the quality of a customer's wafers and masks by quickly and accurately detecting defects and contamination. The model utilizes CCD and QSRI imaging technologies to generate high quality images of photomasks and wafers that can be analyzed to detect and identify defects. The equipment is capable of detecting very small particles, down to 25 nanometers in size, which can help ensure the production of high quality products.