Used KLA / TENCOR eS31 #293606035 for sale

KLA / TENCOR eS31
ID: 293606035
E-Beam inspection system.
KLA / TENCOR eS31 is a mask and wafer inspection equipment for the production of semiconductor devices. It provides wafer-level defect inspection and monitoring of the device characteristics across the entire wafer. KLA eS31 features both 2D and 3D imaging capabilities to detect microstructures, lithographic errors, process steps, defects, and particle contamination on the surface of the wafer. TENCOR eS31 is designed to perform fast and accurate defect detection, with a high throughput of up to 600 wafers per hour. It combines KLA TrueFourierTM 3D imaging technology with an optimized source-target configuration, to capture device defects that can span several mask and wafer layers. This allows the system to accurately detect any defects, even when they occur on different layers. The unit's high sensitivity allows it to detect sub-segment and segment defects, as well as enable edge-to-edge defect searching. The algorithms used by the machine enable the detection of both mask and wafer defects, and the data gathered can be used to provide both pre- and post-patterning defect feedback for improved process performance. The tool also features a unique wafer mapping technology, which allows individual wafers to be identified and analyzed across the entire wafer. This provides improved defect coverage and correlation between the different wafers, allowing operators to more easily identify problem areas. ES31 also features an automated wafer handling asset, which allows it to process up to four wafers at a time. The model also incorporates an in-situ measurement platform, which provides real-time data and analysis to enable timely process optimization and troubleshooting. KLA / TENCOR eS31 is a one-stop solution for mask and wafer inspection, providing fast, accurate, and comprehensive defect detection. Its automated wafer handling capabilities allow it to quickly inspect large batches of wafers and its comprehensive data analysis features enable detailed defect analysis and reporting. By incorporating a range of advanced imaging and data-collection capabilities, KLA eS31 provides reliable and accurate defect detection, efficient equipment operations, and improved process and product performance.
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