Used KLA / TENCOR eS31 #293609359 for sale

KLA / TENCOR eS31 is a highly advanced equipment used for mask and wafer inspection that offers 5nm or better resolution. It provides non-contact, non-destructive inspection for photosensitive features on semiconductor wafers for yield improvement and production control. The system operates with a unique technique known as "scatterometry." Using this technique, an incident light is scattered from the surface of a sample and the detected backscattered light is then analyzed. KLA eS31 utilizes Laser Scatterometry Profiles (LSP) to provide topography measurements across a variety of surfaces. The unit is capable of detecting even the smallest of features, such as line edge roughness, contact holes, and corner radius. Its unique technology also allows for the determination of 3D wafer level mapping and film thickness measurement. TENCOR eS31 machine is capable of analyzing a variety of materials such as photoresist, silicon dioxide, silicon nitride, and other materials commonly used in the microelectronics industry. The tool is designed with an ultra-fast detection time, which makes it ideal for applications where quick turnaround is necessary. Additionally, the asset is automated to allow users to quickly set-up and acquire data. The machine's software offers an integrated Scanning Mode, which allows users to analyze multiple wafers of different size simultaneously with an automated feature detection algorithm that stores and tracks feature size measurements for future reference. Additionally, the model includes a suite of process control features that allows users to customize measurement settings, view and analyze statistical data, and more. ES31 offers a broad range of accessories and systems, such as a light source module, a metrology stage, a thermal imaging module, an AuroClean module, a NuFlats equipment, an SQA module, and a variety of media and filter types. These accessories and systems allow KLA / TENCOR eS31 to be customized according to specific customer requirements, ensuring users always get the most efficient and reliable results. Overall, KLA eS31 is an extremely advanced system designed specifically to facilitate and improve mask and wafer inspection. It provides non-contact, non-destructive inspection with 5nm or better resolution and is capable of scanning and analyzing a variety of materials. With its automated unit, integrated scanning mode, and customizable measurement settings, TENCOR eS31 machine is an ideal choice for semiconductor manufacturers.