Used KLA / TENCOR eS31 #293610174 for sale
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ID: 293610174
Vintage: 2005
E-Beam inspection system
Loader unit
Console unit
Noise cut AVR
(2) Dry pumps
2005 vintage.
KLA / TENCOR eS31 is an advanced mask and wafer inspection equipment designed for maximum efficiency and precision. The system utilizes an advanced high-resolution optics unit, advanced laser diffraction technology, and Advanced Motion ControlTM to provide high quality images at resolutions of up to 10 microns. KLA eS31 is made up of several subsystems and components that work together to provide maximum accuracy and productivity. The machine includes a tomography unit, a wafer inspection stage, microscope objectives, a laser diffraction tool, a sliding stage and automated wafer positioning asset, and a high-precision monitor. The tomography unit features a highly advanced structure, designed to reduce vibration and enhance imaging stability. The tomography unit utilizes an advanced laser illuminator, a 13-inch liquid crystal display, and a focus control model to provide clear and accurate images up to 10 microns, in either a linear or circular pattern. The wafer inspection stage is an advance dual-arm camera holder with precision manipulators and a sliding stage equipment. It's designed to provide maximum accuracy in positioning of the wafer, with minimal drift and stress, while the microscope objectives provide the highest magnification possible even at ultra-high inspection resolution. The laser diffraction system provides maximum accuracy in inspecting specialty structures such as line edge roughness, and is capable of calibrating to 40 microns at a line width of 0.1 micron. The installation of a multi-axis robotic arm further increases the unit's accuracy and precision, speeding up production and leading to more reliable inspection yields. TENCOR eS31 is also equipped with a high-resolution monitor, providing accurate viewing of images up to 10 microns. It features a large, color-coded display, which allows operators to precisely adjust their settings and quickly analyze their results. ES31 is the ideal machine for mask and wafer inspection. Its comprehensive feature set provides maximum accuracy and speed of inspection, ensuring that quality parts are delivered quickly, reliably, and consistently.
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