Used KLA / TENCOR eS31 #293619038 for sale

KLA / TENCOR eS31 is an automated mask and wafer inspection equipment designed for the semiconductor industry. The system uses advanced 2D and 3D inspection technologies to accurately detect defects in advanced semiconductor products. The unit uses automated stitching to create an exact map of the die surface, and employs advanced algorithms to detect defects with high accuracy and reliability. The machine has a high-throughput inspection rate, with the ability to inspect up to 1,500 wafers per hour. KLA eS31 tool is composed of various components, including advanced optics, motion control systems and image processing algorithms. The asset's optics include a motorized objective lens, telecentric illumination, optical filters, and a polarized light source. The optics are used to produce images of higher quality and accuracy than is possible with conventional optics. The motion control model includes a hexapod motion stage that can move in six different axes, allowing the equipment to accurately scan the die surface. The image processing algorithms employed by the system employ advanced machine learning techniques to detect and classify defects on the die surface. The algorithms are able to detect a variety of defects including voids, particles, fractures, and topography errors. The unit is also able to detect the position and size of the defects for most accurate defect classification. Additionally, the machine is able to output images with classification annotations for further analysis and review. TENCOR eS31 is an advanced and reliable tool for performing accurate and reliable mask and wafer inspection. It utilizes advanced optics, motion control systems and image processing algorithms to detect a variety of defects on die surfaces with high accuracy and reliability. The asset has a high throughput rate and is suitable for use in a variety of semiconductor applications.