Used KLA / TENCOR eS31 #9203779 for sale

KLA / TENCOR eS31 is a high-performance Mask and Wafer Inspection Equipment designed to improve production yields. It ensures production of better quality integrated circuits and optoelectronic devices for the semiconductor industry. It provides highly accurate and reliable imaging and measurement capability, enabling rapid quality control and measurement of critical production parameters. KLA eS31 incorporates KLA CCD (charge coupled device) technology with advanced image processing algorithms into a single system that is exceptionally precise. The unit performs a variety of inspection tasks including wafer and reticle (mask) measurement. It incorporates a custom illumination machine, complex imaging algorithms, and special data acquisition techniques to measure extremely small features and variations. TENCOR eS31's unique auto-focus feature presents an advantage over traditional automated optical inspection systems by providing an improved range of focus. It also enables automatic and optimal data acquisition of various surface characteristics such as particle size, particle type, topography, and assembly features. ES31 offers a wide variety of scanning and task options, allowing the tool to be designed and configured to individual customer requirements. The asset can be configured with a variety of accessories to address a variety of needs, including automated electrical test systems, automated optical probing and alignment systems, and stand-alone optical systems. KLA / TENCOR eS31 offers a wide and ever-changing range of tools. In addition, the model integrates seamlessly with the customer's existing production systems, minimizing additional hardware requirements. This helps to ensure improved scalability and greater production flexibility. The equipment's flexible software allows multiple datapoints to be collected. The software can be tailored to the customer's needs, allowing the inspection and analysis of various defects, including reticle, mask, and wafer characteristics. The software can also be used to generate reports that provide detailed analysis of the quality andperformance of the system's components. In conclusion, KLA eS31 is a high-performance Mask and Wafer Inspection Unit designed to improve production yields. It is incredibly precise, features an auto-focus with an improved range of focus, and features a flexible software with multiple datapoint selections and reporting options. It additionally integrates seamlessly with existing production systems, ensuring improved scalability and greater production flexibility.