Used KLA / TENCOR eS31 #9269700 for sale

ID: 9269700
E-Beam inspection system Upgraded Fixload V6 load port, 12".
KLA / TENCOR eS31 is a next-generation mask and wafer inspection equipment, designed for use in high-volume semiconductor production processes. It features advanced imaging technologies and software, to provide fast, accurate and reliable inspection of both masks and wafers. KLA eS31 system is based on an automated scanning electron microscope (SEM), with an integrated optical microscope for optical inspection. It allows higher throughput and better image quality than previous generations. Additionally, it provides fast throughput, with a target speed of 0.75 specimen/min. The image sensors of TENCOR eS31 unit employs patented "e-pulse imaging" technology, to harvest up to 8x higher signal intensity than conventional SEM systems. This enables extremely high accuracy analysis of patterns on masks and wafers, at nanometer resolution. It is designed to detect both open and short circuits, to identify contact defects and other aberrations in the structure. ES31 machine also features powerful software, which is capable of recognizing the patterns used in the semiconductor production processes. For instance, it can detect long/short lines, both horizontally and vertically, and also features edge detection and defect detection algorithms to identify any errors with high accuracy. Thanks to its advanced algorithms, KLA / TENCOR eS31 tool can automatically recognize patterns, reducing the need for operator intervention. The asset also provides a range of specialized interfaces, to connect to test instruments, such as AFM and RHEED. This allows detailed analysis of layers and layer correlation, enabling users to attain unprecedented levels of accuracy. Moreover, its multi-language support (Chinese, English, Korean, Japanese, German and French) makes it accessible to a wide range of clients. KLA eS31 model is the perfect choice for a wide range of semiconductor processes. It provides a cost-effective option, for achieving the highest standards of precision in mask and wafer inspection. Highly accurate and reliable, TENCOR eS31 equipment is sure to revolutionize semiconductor production processes, enabling faster throughput and better image quality.
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