Used KLA / TENCOR eS31 #9300221 for sale
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KLA / TENCOR eS31 is a high performance, automated mask and wafer inspection equipment designed to detect the slightest defects in electronic devices, such as semiconductor integrated circuits (ICs). KLA eS31 uses digital imaging technology to capture and analyze images of mask and wafer surfaces to detect even the smallest defects. The system can detect skewed lines, particle contamination, or missing patterns that were rejected in various process steps. Using advanced automated image processing algorithms, images are automatically analyzed with no human intervention. The analysis includes categorization of test patterns, mask/wafer alignment and inspection of the critical features of all mask patterns. TENCOR eS31 detects threading defects, non-uniformity, coherence and inversion errors, as well as particle contamination. A unique feature of eS31 is its ability to inspect for ultra-low-voltage (ULV) defects, for which other systems cannot achieve complete detection. KLA / TENCOR eS31 is a fully integrated, high-speed unit operated through a monitor and a mouse. It provides an extremely high throughput, operating at speeds up to 300 wafers per hour. The machine also features an intuitive user interface and advanced menu-driven operation for ease of use. KLA eS31 is capable of testing a wide range of patterns, wafers and masks. The tool is powered by state-of-the-art inspection technology, which includes a CCD camera, LED lighting, a camera controller, a console controller, a Robo-sys controller, and a z-stage to move the inspection asset over the wafer. It also offers quality post-processing capabilities to accurately inspect defect size and types. The model is upgradable to accommodate new requirements and technologies. Overall, TENCOR eS31 is ideal for rapid mask and wafer inspection. It combines high-speed precision imaging with advanced defect detection capabilities to ensure products are manufactured to the highest standards. The equipment is easy to set up and operate, and is capable of inspecting a wide range of masks and wafers.
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