Used KLA / TENCOR eS32 #9139567 for sale
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ID: 9139567
Wafer Size: 12"
Vintage: 2007
Electron-beam defect inspection (EBI) tool, 12"
2007 vintage.
KLA / TENCOR eS32 is a mask & wafer inspection equipment designed to provide the highest levels of precision and accuracy when it comes to analyzing dielectrics, thin films and other structures on the nanometer scale. The system uses state-of-the-art optical and imaging technologies to detect and analyze defects with resolutions as small as 0.1um. This high-resolution image enables users to identify small particles, particles and other contaminants that may cause malfunctioning of the device. The unit is equipped with 2 lenses, each with a different numerical aperture, that allow it to capture both the top-view and the cross-sectional views of the wafer. Furthermore, KLA eS32 includes near-infrared (NIR) imaging and wavelength-filtering technology to help identify and isolate defects that may be invisible to conventional optical microscopy. In addition to its powerful imaging capabilities, TENCOR ES 32 also provides users with a suite of software features such as automatic defect analysis, pattern recognition, and color-coded data labeling, etc. to further facilitate inspection processes. The machine is also compatible with a wide range of supported industry standards, including SEMI E10 and MIL-STD-1275. ES 32 is designed to withstand the most rigorous environments. It is built with a lightweight and rugged aluminum alloy housing that is designed to withstand shock and temperature swings. The tool also features user-defined motion delay, to ensure that the asset remains in the same location during an extended period of observation or analysis. In conclusion, eS32 is one of the most powerful and reliable microscopy tools and imaging systems available on the market. High-resolution imaging and powerful software features make it the perfect tool for identifying nanoscale particles, defects, and other problems related to processing or operational performance.
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