Used KLA / TENCOR eS32 #9205645 for sale

KLA / TENCOR eS32 is a powerful mask and wafer inspection equipment that provides real-time defect detection for the most demanding semiconductor fabrication processes. It offers breakthrough performance and can inspect up to 32 complex masks or wafers simultaneously. The system has a variable resolution of down to 0.26 micron, a fourfold improvement over the previous unit. This enables it to detect sub-optical defect sizes, which is essential for ensuring yield in modern 16 and 20 nanometer semiconductor fabrication. KLA eS32 uses a Dynamic Focus Module (DFM), which automatically adjusts the focus for each layer of inspection. This provides best-in-class image clarity and eliminates problems caused by inaccurate stage calibration. The machine also incorporates a proprietary Q-Detect algorithm, which allows it to detect complex defects that would otherwise remain undetected. This sophisticated algorithm combines three detection ideologies in its logic, in order to cover all possible defect types. In addition, TENCOR ES 32 features unique image capture capabilities that can capture the entire wafer in one snap shot. This increases throughput and reduces the risk of defect escape. Moreover, the tool is equipped with a High-Dynamic Range (HDR) image processor, which can easily distinguish between microscopic defects and feature signatures for improved defect classification. KLA / TENCOR ES 32 also utilizes KLA iQ technology to optimize inspection performance. This technology uses machine-learning algorithms to automatically adjust inspection operations in order to detect difficult defects. In conclusion, KLA ES 32 is the perfect solution for advanced mask and wafer inspection. It delivers superior performance and offers a wide range of features that enable it to detect even the smallest defects. It is an ideal tool for the semiconductor industry, ensuring optimum yields and the best possible products.