Used KLA / TENCOR eS32 #9255738 for sale
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ID: 9255738
Wafer Size: 12"
Vintage: 2007
Defect inspection system, 12"
With hybrid port control
Load ports, 8"-12"
Wafer handler:
SMIF, 8"
FOUP, 12"
With insert, 8"
Open cassette, 8"-12"
Standard pixel size:
0.025, 0.035, 0.05, 0.07, 0.10, 0.15, 0.20, and 0.30 pm
Inspection modes:
Array mode (Cell-to-cell)
Random mode (Die-to-die)
Master reference inspection (Die-to-any die)
User Interface
Inspection station
Dual EFEM
Power line conditioner
EBARA ESR80WN Dry pump
Electrical distribution box
2007 vintage.
KLA / TENCOR eS32 is an advanced, cost-efficient mask and wafer inspection equipment which can detect particle and defect inspections on a variety of masks and wafers used in production line. The system utilizes high-resolution optical imaging to generate crisp images of nano and micro-sized components used in wafer production. Its unique sidewall imaging capability also enhances the accuracy and speed of inspection results, such as angle defect detections. The patented Dark Field Bright Field and OmniBeamTM techniques additionally broadens KLA eS32's specifications to detect particles down to 0.2 µm. This unit has the capability to detect surface particles on wafers, including resist residue, metallization, haze, E-beam resist scratches, and others. Its special Dark Field Bright Field imaging combines angle-dependent and angle independent inspections to yield more precise results in comparison to traditional dark field inspections. This enables the machine to detect wire breaks or other angles defects that would otherwise be invisible. The patented OmniBeamTM and Oblique Angle Light technique increases light intensity which further enhances the inspection results. Due to its user-friendly interface and intuitive software, the tool is very easy to set up and operate. The software utilizes pre-defined workflows and parameters to automatically detect, analyze and categorize defects, and allows for further analysis and comparison. The asset has the capability to store and compare a variety of inspection results, enabling quick and easy analysis of complete production line without any hassle. With its ability to perform a global search for defects within nanoseconds, TENCOR ES 32 mask and wafer inspection model is a fast and reliable solution for catching all even the tiniest of defects. Its automation capabilities allow for fast and accurate inspections, resulting in cost savings and efficient production cycles. Furthermore, its user friendly interface and intuitive software interface provide easy setup and operation, making the equipment ideal for fast, precise and cost savings in production line.
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