Used KLA / TENCOR eS32 #9282549 for sale

KLA / TENCOR eS32
ID: 9282549
E-Beam inspection systems.
KLA / TENCOR eS32 is a mask & wafer inspection equipment designed for deep sub-micron resolution metrology to enable accurate pattern characterization. With its unique combination of advanced analysis algorithms and footprint-based optics, KLA eS32 is capable of capturing artifacts down to the smallest levels. TENCOR ES 32 offers a 3D imaging system with multiple imaging options. It is equipped with two cameras, the four- channel TENCOR eS32 Camera & the five-channel eS32-T Camera. KLA ES 32 camera captures images with up to a maximum pixel resolution of 1024 x 1024 while ES 32-T has a maximum pixel resolution of 2048 x 2048. This unit can be utilized for a variety of patterning applications including mask inspection, wafer inspection, and overlay inspection. KLA / TENCOR ES 32 utilizes advanced imaging technology that enables deep sub-micron pattern resolution and it can detect particles down to 0.5μm. This intense pattern analysis is powered by KLA / TENCOR eS32's proprietary software, which employs advanced algorithms to provide high-resolution analysis. Additionally, KLA eS32 has an integrated overlay machine that is able to provide overlay measurements for reticles, masks, and wafers with exceptional accuracy. TENCOR ES 32 comes with a built-in surface inspection tool, TENCOR eS32-SE. ES32-SE is a fully-integrated lens-based asset, which incorporates a variety of illumination sources, including dark field and bright field imaging. This model can be used to detect faulty particles, scratches, dust, and other contaminants on the surface of wafers and masks. KLA ES 32 features an intuitive graphical user interface and a robust software platform. This allows users to quickly and easily customize the equipment to their unique application requirements. Additionally, the system is capable of automatically adjusting to different wafer sizes without the need for manual intervention. ES 32 is an ideal tool for the ultra-fine patterning applications of today's advanced technologies. With its superior imaging capabilities, automated alignment unit, and user-friendly interface, KLA / TENCOR ES 32 is an efficient mask and wafer inspection solution for deep-sub-microscopic feature characterization.
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