Used KLA / TENCOR eS32 #9354570 for sale

KLA / TENCOR eS32 is a mask and wafer inspection equipment that uses advanced optical inspection and metrology technology to detect defects on wafers and thin film masks used in the semiconductor manufacturing process. Its optical beam characteristics are tailored for maximum resolution and precision, and its high speed acquisition electronics allow for rapid imaging of the subject matter. KLA eS32 is capable of detecting defects on k1/k2 levels, and can expose high-density mask pattern defects. It can also measure mask feature dimensions, layer thickness, and intersection angles. This ease of recognition is facilitated by the use of the scanning electron microscope which allows for high resolution imaging of the wafer and thin film mask characteristics. Its advanced system architecture is intended to deliver continuous inspection with high throughput across a wide range of wafer and thin film mask diameters. KLA proprietary electrical source controllers are designed to provide highly consistent evaporation rates. This allows for repeatable results in even the most challenging applications. TENCOR ES 32 also offers high- and low-energy options for X-ray inspection. Its high-energy unit option is enabled by two micro-focus X-ray sources, which provide excellent contrast between wafer present and mask layer features. The low-energy machine option, equipped with 1.2mV X-ray sources, examines subtle defects in wafer patterned features. The tool's quick and easy control interface enables operators to customize processing parameters based on specific production requirements. To further improve process control, eS32's process-matching software optimizes parameters with each stage of the inspection process. This results in precise and complete inspection of mask layers with a high degree of accuracy. The optimally-calibrated systems of TENCOR eS32 are designed to provide complete metrology data that has improved speed and precision. An intuitive control interface allows efficient operation and comprehensive data gathering for analysis and reporting quickly. Overall, KLA / TENCOR ES 32 is a highly advanced and reliable mask and wafer inspection asset that offers unparalleled accuracy and detail. Its high resolution optical and metrology capabilities allow for precise identification of defects on both wafer and thin-film masks, speeding up the process and ensuring a high level of product quality.