Used KLA / TENCOR ES35D #9254833 for sale

KLA / TENCOR ES35D
ID: 9254833
Vintage: 2006
E-Beam inspection system 2006 vintage.
KLA / TENCOR ES35D is a unique combination of a mask and wafer inspection equipment that is used in semiconductor fabrication facilities. This tool helps to detect microscopic defects in both images and wafers used in chip manufacturing. It features an inspection area that can accommodate mask sizes up to 356 mm x 438 mm and a wafer size up to 508 mm. The system uses a patented low-backscattering Laser Learning Sensor (L3S) technology to identify defects on images and wafers. This technology provides extreme sensitivity and accuracy in detection of defects, and can detect both particle contaminants and layout defects. It can also detect defects to a submicron level, as small as 0.05 microns, and can detect defects with a high degree of accuracy. The unit is composed of two parts: the front-end and back-end. On the front-end, the machine utilizes a multi-channel optics with a variable zoom lens to provide hight resolution images. Images captured by this tool can be processed in real-time, allowing the user to efficiently inspect multiple wafers and masks simultaneously. On the back-end, the asset can flag Image Analysis (IA) measurements and critical monolithic defect inspections to pinpoint the location of potential defects. It also provides pattern-matching and Shape Recognition capabilities to identify locations where defect-free wafers or masks are required. The model can export images to other locations or save the inspection data in a database. KLA ES35D is designed to minimize false alarm levels and increase production throughput. The equipment also features a number of automated functions which can improve inspection speed and accuracy, as well as reduce manual inspection time. Its advanced pattern recognition technology helps identify and analyze the position of particles and layout defects. Overall, TENCOR ES35D is an advanced and reliable tool for various high-resolution image and wafer inspection tasks. It is specially designed to enhance manufacturing speed and accuracy. Its Laser Learning Sensor (L3S) technology, together with the dedicated back-end capabilities, make it an extremely useful system for a wide range of semiconductor production requirements.
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