Used KLA / TENCOR eS37L #9232829 for sale

KLA / TENCOR eS37L is a mask and wafer inspection equipment designed to detect physical defects on lithographic masks and wafers used during the semiconductor manufacturing process. It is capable of detecting ultra-small defects of as small as 45 nm. It features a large field of view, enabling it to image more than 30 wafers or masks simultaneously and scan up to 140 scan fields per second. Additionally, the system is highly adaptive since it can be reconfigured to meet specific custom detection requirements in response to changing process needs. KLA eS37L unit uses advanced imaging technology to identify, classify, and detect defects on masks and wafers. This is achieved through numerous optical components, including precise lenses and light sources. It also incorporates proprietary KLA technology, including patented ARCSharp™ aperture technology and TeleSight™ signal processing algorithms. ARCSharp™ technology takes advantage of the four-quadrant scan architecture to improve imaging and defect detection performance. The machine then analyzes the images to determine the shape and size of the defect, and identifies the location on the wafer or mask. TENCOR eS37L tool features advanced software, allowing for automatic defect classification and review. It also features a comprehensive reporting suite, enabling detailed analysis of inspection results. Additionally, the asset is fully automated and integrates with existing automated equipment, such as wafer sorters, conveyor systems, and track and trace systems. This integration helps ensure that the model is used in the most efficient manner. ES37L equipment is an essential tool for the efficient and accurate detection of defects on masks and wafers used in the semiconductor manufacturing process. Its advanced imaging technology, automated defect classification, and comprehensive reporting capabilities enable quick and accurate defect detection and analysis, enabling the detection of minute physical defects. In addition, its software integration capabilities help ensure that the system is used in an efficient manner. KLA / TENCOR eS37L unit is a reliable, efficient mask and wafer inspection machine.