Used KLA / TENCOR EV300 #9267083 for sale

KLA / TENCOR EV300 is a fully automated, high-definition mask and wafer inspection equipment designed for critical optical and metrology applications. KLA EV 300 utilizes advanced laser scanning interferometry (LSI) technology to provide superior defect detection and quick yield assessment over a wide range of mask and wafer technology platforms. The system's high throughput throughput and improved productivity allow for faster turn-around, reducing cost of ownership. TENCOR EV-300 includes a proprietary vision-based unit that enables high-throughput, real-time imaging with Phase Shifting and Intensity Imaging for mask and wafer inspection applications. This machine allows for the inspection of large-format masks, including organic and inorganic masks, as well as standard flat-panel-display substrates, all at a resolution greater than 0.2µm. The tool's enablement of phase shifting functions for mask and substrate inspection up to 0.1nm allows for the detection of critical defects, which would otherwise remain impossible to detect using conventional mask inspection technologies. KLA EV300 also includes a laser scanner designed for optimum throughput and flexibility with simultaneous imaging and accurate defect detection. This is achieved through a patent pending beam-steering actuator technology which allows for improved scan rate optimization and ease of calibration. The laser scan engine is designed to detect micro-defects on masks and substrates, while a dedicated wavefront interferometer provides phase shifting functionality for more accurate inspections. KLA / TENCOR EV-300 also includes an integrated suite of software tools to enhance process control and improve productivity. The software includes an intuitive graphical user interface (GUI) that simplifies the task of inspecting and analyzing complex, multi-layer masks. Additionally, the ability to customize the user interface allows for a unique user experience and automated workflow. Furthermore, the software also includes process characterization and analysis functions, such as data analysis, defect identification, characterization, and test optimization. Overall, KLA / TENCOR EV 300 is an advanced, fully automated mask and wafer inspection asset, designed for critical optical and metrology applications. Its combination of high-throughput imaging capabilities, laser scanning, and dedicated wavefront interferometry help to facilitate defect detection and yield assessment, thus reducing cost of ownership and improving process control. With the capacity to inspect organic and inorganic masks, standard flat-panel-display substrates, and micro-defects, EV-300 maximizes efficiency for a wide range of applications.