Used KLA / TENCOR EV300 #9399037 for sale

KLA / TENCOR EV300 is an advanced mask and wafer inspection equipment designed to detect, characterize and correct a wide range of defects. This system combines high-resolution optical imaging, programmable defect review, defect avoidance and corrective automation technology, to offer superior wafer inspection performance. The unit's optical imaging technology is capable of detecting defects as small as 0.25 microns. This highly sensitive imaging machine is optimized for the examination of both mask and wafer patterns, allowing highly accurate inspection results. The tool's programmable defect review tool enables automated detection and classification of various defects. The tool is programmed to detect and classify shift, blur, stitching and OPC defects, among other types. The asset also features defect avoidance technology for reducing the number of false positives during the inspection and correction of the detected defects. KLA EV 300 also includes a sophisticated corrective automation technology. This technology is used to automatically perform corrective action, such as pattern location, reorientation and cleaning. This corrective process is optimized to ensure that no defect is missed or left unattended. The model also has a secure communication interface that facilitates the exchange of data between equipment components. This allows the integration of other KLA systems, such as the SEMVisionTM suite and the ALINX automated defect review system. TENCOR EV-300 unit is designed to provide the highest levels of wafer and mask inspection performance, ensuring that devices are defect free and ready for production. This machine is therefore suitable for use in both research and industrial production environments.