Used KLA / TENCOR FLX-5200 #9148242 for sale

KLA / TENCOR FLX-5200 is a mask & wafer inspection equipment that provides advanced imaging and data analysis capabilities in order to determine micro-defects and other sorts of contaminants. It is a valuable tool for identifying issues at the surface and sub-surface level that can compromise the integrity of a wafer or mask. The primary purpose of KLA FLX-5200 inspection system is to detect and characterize defects and contaminants on samples such as mounted wafers, photomasks, masks, and reticles. The unit is specifically designed to examine patterns that measure between 25nm and 6μm, making it an ideal choice for a wide variety of micro-electronics manufacturing processes. TENCOR FLX 5200 utilizes advanced imaging and analytical capabilities in order to deliver meaningful data across the entire inspection process. Through three and four-way imaging, which includes a mix of white, ultraviolet (UV) and optical nodes, data is collected from all sides of the device - from top-down, inside-out, sideways, backwards, and more. This data is then analyzed and reported in an automated fashion, providing an efficient and accurate picture of the inspected object. KLA / TENCOR FLX 5200 also features ultra-high resolution imaging and enhanced focus capabilities that allow the user to zoom in and inspect minute details on the wafer surface. This is ideal for identifying particles and other contaminants at the nanoscale level. To further enhance the inspection process, the machine includes automated alignment and measurements that account for features on the surface and in the substrate. The tool also comes equipped with an intuitive operator interface and advanced imaging techniques. This combination makes it simple to set up the asset, capture data, and generate actionable reports. In a nutshell, FLX-5200 is a cutting-edge mask and wafer inspection model that provides high-speed imaging, automated measurement, intuitive controls, and enhanced focus capabilities for reliable detections and characterizations of defects and contaminants in a wide variety of substrates. It is an invaluable tool for ensuring accuracy and quality control in micro-electronics manufacturing.