Used KLA / TENCOR FLX 5200H #9148307 for sale

KLA / TENCOR FLX 5200H is an automated mask and wafer inspection equipment designed for high throughput sub-nanometer critical dimension (CD) measurements. The system uses advanced optical imaging and metrology capabilities to provide sub-50nm feature levels with unsurpassed resolution and accuracy. The unit is capable of a wide range of pattern and process inspection tasks, from small mask features to large photolithography structures. KLA FLX 5200H features a two-axis galvanometer design with large aperture optics and a chuck capable of up to 200mm wafers. The machine's optics are arranged in an optical bench, enabling up to 6 independent inspection paths for different measurement tasks. The optics are composed of a Laser FabSuite of lens, filters, and detectors for optimizing spectral accuracy and enabling high resolution. A full-size wafer stage enables stable measurement results with precise alignment. TENCOR FLX 5200H is designed to meet the challenging pattern and process inspection requirements of the semiconductor industry with a wide range of inspection tasks and applications. The tool offers superior depth of focus, allowing for fast aCIS image capture, and the best possible metrology uses 100x magnification for the most accurate CD measurement capabilities. In addition, the asset can perform a wide range of mask inspections which can help to identify defects and ensure the most accurate results. FLX 5200H utilizes advanced image processing and analysis algorithms in conjunction with a sophisticated computer model. Built-in recipe processing and coding allows for rapid prototyping with the most efficient data management possible. The equipment runs on specialized software written for high-speed and high-volume inspection. KLA / TENCOR FLX 5200H is an advanced, high-spec, mask and wafer inspection system designed to provide the most precise and accurate inspection and metrology measurements possible in an automated environment. The unit's laser-based optics, two-axis motion, and high-resolution wafer stage guarantee the quality of the measurement results, while its flexible software and easy integration into wafer fab processes enable normalization and optimization for various applications.