Used KLA / TENCOR FLX-5400 #9088894 for sale
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ID: 9088894
Stress measurement system
Measurement area: 1 ~ 10 Mpa
Throughput: 60 wafers per hour
H3 Handler
GEM/ SECS
(2) Lasers: Red and Infrared
Intensity: 2~4 at 670 nm, and 2~4 at 750/780 nm
Wafer presence sensor
Vacuum sensor
Open cassette port: 8"
OS: Windows 3.11
Software" WINFLX 4.40
CPU: MMX 233 MHz
Floppy disk: Yes
LED Monitor
HP Deskjet 660C printer
Facility requirements
Main body: 100 VAC, 1P, 50/60 Hz at 7A
Printer: 115 VAC, 1P, 50/60 Hz at 7A
Input vacuum: 560 mmHg
1996 vintage.
KLA / TENCOR FLX-5400 is a mask and wafer inspection equipment that is used to detect and characterize fabrications defects present in semiconductor devices. This powerful system combines advanced wafer inspection technology and a powerful, foolproof software interface to ensure the highest-quality semiconductor devices. KLA FLX-5400 has a customizable field of view (FOV) that enables users to change the size of the inspected area and the calibration of the unit. This allows users to tailor the FOV to their specific requirements, and also offers the flexibility to inspect very small defects or larger features. The machine is also capable of varying the field of view throughout the inspection process to prevent false-positives due to field of view anomalies. At the heart of TENCOR FLX 5400 is a high-powered inspection subsystem, which consists of four advanced CCD sensors that perform a specialized patterned illumination technique, known as Moiré fringe projection. This advanced technique is used to detect minute variations in topography that cannot be seen with traditional optics-based methods. TENCOR FLX-5400 also utilizes these advanced CCD sensors to automatically align the wafer for optimal feature detection, and provides powerful edge detection algorithms that allow users to detect subtle edge variations. The tool also has a range of features that ensure high-precision defect detection and image enhancement. These features include image restructuring technology, which corrects for non-uniform illumination, a three-dimensional feature detection algorithm that increases defect detection capabilities, and an integrated defect review asset that provides realistic resolution when gauging defects. Additionally, KLA FLX 5400 provides a user-friendly software interface that reduces training and equipment setup time. An intuitive graphical user interface (GUI) guides users through the setup process, including inspection parameter setup, layer assignment, and image tuning. Its powerful software suite also includes powerful FLX software tools, such as automated defect classification, false defect reduction, and a pattern verification tool. In sum, KLA / TENCOR FLX 5400 is an advanced mask and wafer inspection model that combines sophisticated optics-based defect detection technology and advanced inspection features with an intuitive software interface to give users a powerful tool to maintain the highest-quality semiconductor devices.
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