Used KLA / TENCOR FLX-5400 #9118978 for sale

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ID: 9118978
Wafer Size: 8"
Vintage: 1996-1998
Automated thin film stress measurement systems, 8" Throughput of 60 wafers per hour Dual wavelength technology 1996-1998 vintages.
KLA / TENCOR FLX-5400 is a high-performance mask and wafer inspection equipment that utilizes leading-edge inspection technologies to provide accurate and reliable defect detection and classification. This system is designed to accommodate both high-volume wafer fabrication and mask fabrication environments. KLA FLX-5400 is a dual-field unit composed of an optical inspection module and a defocus detection module. The optical module contains an ultra-fast LED array for illumination and optical image acquisition and is designed for the inspection of feature patterns. The defocus detection module utilizes an advanced optical lens machine in order to detect extremely small defects in the structure of the wafer. TENCOR FLX 5400 is designed to provide high throughput- even with the inspection of a large number of wafers. This tool is equipped with both a high-speed scanning head and a high-capacity data processor, thus allowing for flexible and efficient semiconductor manufacturing processes. The asset is able to detect defects down to 0.5 micrometers(μm). KLA / TENCOR FLX 5400 comes with a granular defect classification functionality. This feature allows the model to group detected defects into multiple classes for easy post-inspection analysis. Additionally, the equipment's software algorithms are tuned for improved defect reporting accuracy. TENCOR FLX-5400 allows for automated system calibration and provides network-connected remote monitoring capabilities. This unit also offers an integrated overall machine analysis tool for comprehensive wafer analysis and reporting. In terms of software, FLX 5400 features powerful advanced analytical tools for advanced defect characterization and metrology. Additionally, the user-friendly software interface enhances user experience with features like touch-screen operation, Icon-based menu structure, and a powerful back-end database. FLX-5400 is capable of both multilingual user support and global access, making it a great choice for global mask and wafer inspection. This tool is compliant with multiple normative standards, including SEMI standards, so users can trust in its reliability. Overall, KLA FLX 5400 is a powerful and accurate mask and wafer inspection asset that helps to ensure quality in the process of semiconductor fabrication. With powerful capabilities such as automated model calibration, defect classification, and cost-effective operation, KLA / TENCOR FLX-5400 is a great choice for wafer and mask inspection applications.
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