Used KLA / TENCOR / HAMAMATSU R1617HA #200233 for sale

KLA / TENCOR / HAMAMATSU R1617HA is a high-performance mask and wafer inspection equipment designed to detect previously undetectable defects and contamination on patterned wafers. The system combines multiple inspection techniques to offer users the utmost flexibility and accuracy in their production process. The unit offers a full suite of inspection techniques, including photomask inspection, wafer inspection, critical dimension (CD) measurement, and electrical testing to detect defects spanning multiple levels of the fabrication process from mask to finished wafer. First, the machine offers advanced mask inspection capabilities. Using dark field light (DFL) and bright field light (BFL) imaging techniques, the tool can distinguish between flaws on the photomask that are visible or invisible under regular illumination. Additionally, back side inspection identifies subtle defects on the reverse side of the mask, extending coverage from conventional asset designs. Next, the model offers precise wafer inspection and analysis. Critical Dimension (CD) inspection detects and measures fine details of the design pattern, while an array of inspection techniques such as transmission dark field, bright field, and spectral imaging enable the equipment to detect a wide range of defects on the wafer surface. For electrical tests, the system has integrated circuit (IC) test capabilities, yielding a low defect density on product wafers. In addition to these features, the unit utilizes specially designed components for a variety of sub-micron features and optical thin-film structures, supporting accuracy over a wide range of applications. Furthermore, the machine is designed with advanced optics and illumination sources to enable defect detection without compromising throughput. To ensure maximum reliability and performance, KLA R1617HA is designed and manufactured with advanced electromagnetic (EM) testing, vibration, and temperature control, and utilizes robust hardware/software components and tool management processes. The asset is also completely scalable, making it a versatile solution for a variety of production requirements. In summary, TENCOR R1617HA is a powerful mask and wafer inspection model that offers accurate defect detection, precise wafer CD measurement, and reliable electrical testing for a wide range of fabrication processes. Combining a sophisticated design with rigorous quality control processes, the equipment provides a reliable and cost-effective solution for advanced production requirements.