Used KLA / TENCOR / ICOS CI 9450 #9312490 for sale

KLA / TENCOR / ICOS CI 9450 is a vision inspection equipment designed for quality assurance of photomasks and wafers. It is used to detect defects on the surface of photomasks and printed wafers. The system uses multiple illumination sources and multiple views of the same specimen for the inspection. A high resolution camera captures images of the specimen, while powerful software algorithms analyze the images to detect defects. KLA CI 9450 uses Calibrated Binary Optics (CBO) technology to ensure precise and repeatable defect detection. This technology allows it to identify, count, and classify defects with high accuracy. Additionally, it is capable of differentiating between particle- and pattern-related defects. ICOS CI-9450 is designed to meet the current and future requirements of Critical Dimension Scanning Electron Microscopy (CD-SEM) and Mask Metrology systems. Its patented technologies enable it to detect defects as small as 0.6 microns. It uses a combination of pixel-based pattern recognition, contrast measurement, dynamic range analysis, and edge detection algorithms for fault detection. It also provides a false-alarm free inspection environment at high throughput speeds. It can inspect up to 200 wafers per hour and up to 5000 square inches of photomask per hour. The unit's small footprint enables it to be integrated into a production line for automated inspection. KLA CI-9450 is an ideal option for production lines that require a reliable inspection machine with superior accuracy and precision. Its advanced technologies and features make it ideal for quality assurance tasks in the semiconductor and photolithography industries.