Used KLA / TENCOR / ICOS CI-T130 #293616257 for sale

KLA / TENCOR / ICOS CI-T130 is an advanced mask and wafer inspection equipment that provides the highest level of accuracy and precision for mask and wafer quality control. This system employs advanced Optical Proximity Correction (OPC) technology to inspect and detect defects on masks. KLA CI-T130 utilizes an Opto-Mechanical Pattern Overlay (OMPO) technique to create high-resolution images of mask patterns. This process accurately detects several types of mask defects such as line widths, opens, shorts, breaks, and other irregularities. The unit utilizes high-precision lenses, XY stages, and edge detection to capture the images. These images are then further processed by the OPC software which enables the machine to accurately measure and compare the original design and the manufactured wafer. In addition, ICOS CI-T130 also provides specialized capabilities to detect particles that may have been introduced into the process during wafer manufacturing. The particle detector module utilizes automated dark field microscopy and a powerful electrostatic imaging technique to accurately identify and count particles that are quickly dispersed during the process. The tool also provides advanced analytical capabilities to detect the thickness variations of films on the wafer surface. This is achieved by using high resolution surface height measurement techniques such as Structured Light Interferometry. This technology enables CI-T130 to measure surface height variations with sub-nanometer accuracy. In addition, the asset includes a Direct Bright Field Photon Module (DBPM) which can detect sub-visible defects on masks faster and more accurately than any other technologies. The DBPM process enables the model to detect the presence of pins, flaws, cracks, and contamination with greater accuracy than would otherwise be possible. TENCOR CI-T130 also includes a highly versatile automation suite which allows users to create and customize automatic routines to analyze mask and wafer defects. The automation suite provides flexibility so that users can specify which layers of the structure are inspected and what types of analysis are performed on each layer. KLA / TENCOR / ICOS CI-T130 is a powerful and feature-rich mask and wafer inspection equipment which is designed to meet the strict demands of the semiconductor industry. With its advanced OPC technology, accurate surface height measurements, and versatile automation suite, KLA CI-T130 provides a comprehensive inspection solution for mask and wafer quality control.