Used KLA / TENCOR / ICOS CI-T130 #293639085 for sale

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ID: 293639085
Lead scanner Tray to tape / reel (10) PnP heads 3D: CCD: IVC-4000 Lens (QLM): RLM 2D: CCD: IVC-4000 Lens (RLM): RLM IS2 Top Mark: CCD: IVC-4000 Lens: 45mm Function: QFP TSOP BGA QFN BGA 5S SBH PIC (Double IC detecter) Normal Top Plate module TTH (component heigh module) QFN module Operating system: Windows XP.
KLA / TENCOR / ICOS CI-T130 is an advanced Mask & Wafer Inspection equipment designed to provide unparalleled accuracy, speed and image quality in chip and mask production. The system utilizes a unique combination of optics and imaging technology to deliver an unparalleled level of accuracy and inspect feature sizes at down to 0.003 microns. KLA CI-T130 is fully integrated with both chemical-mechanical polishers (CMPs) and chemical vapor deposition (CVD) systems, ensuring consistent results by automatically measuring surface profiles and defect-free topography of each wafer and mask. The unit also uses powerful vision algorithms to detect any critical defects or potential yield losses. The machine also provides true high-resolution imaging with its dual beam optics. The first beam is a bright-field OptiScan pattern, which captures full image data for 100% inspection, with a maximum resolution of 300 mm/pixel. The second beam is an LED dark-field OptiScan, providing 30 mm/pixel resolution for high-resolution imaging, which is used to detect sub-pixel defects and granular topography features that can't be detected with the brighter optics. ICOS CI-T130 utilizes a state-of-the-art image-processing engine with powerful pattern recognition software to enhance viewing clarity and reduce false positives. The tool also provides layer-by-layer wafer inspection, allowing users to identify and diagnose microscopic features and defects quickly and accurately. Aside from mask & wafer inspection, CI-T130's capabilities also include integrated metrology, sample prioritization and defect classification. It also has a built-in SPC data logging asset, which allows users to track incoming and outgoing metrics, providing them with an at-a-glance view of the overall performance of their production line. Overall, TENCOR CI-T130 offers unrivaled inspection, imaging and metrology capabilities for producing the highest quality integrated circuits and masks. With its industry-leading accuracy, speed and image quality, users can trust KLA / TENCOR / ICOS CI-T130 to detect and resolve any potential yield losses quickly and accurately.
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