Used KLA / TENCOR / ICOS CI-T130 #9389311 for sale

KLA / TENCOR / ICOS CI-T130 is a Mask and Wafer Inspection equipment designed to deliver high performance and accuracy for inspecting the critical pattern elements on advanced semiconductor wafers. The system provides both superior optical image quality and resolution to enable full comprehensive defect inspection. It is equipped with two wafer slots, one for imaging and one for pattern verification, as well as high-precision image pre- and post-processing functionality to ensure consistent defect detection and classification results. KLA CI-T130 is an advanced and versatile unit designed to deliver high speed and accurate defect review. It is fitted with a high-resolution CCD camera that can be tailored to specific imaging requirements. With a wide range of optics available, it is capable of performing a variety of imaging techniques such as micro-defect capture, wide area capture, ultra-high resolution images, and cross-sectional images. The machine also includes two video channels for viewing on a monitor or on an automated image analysis tool. The asset is designed for easy operation and offers an intuitive user interface to reduce setup time and optimize performance and accuracy. The user has the ability to quickly configure the model for advanced defect inspection and review through an interactive graphical menu. Optional software libraries can optimize detection of specific defect classes, such as line defects, particle defects, defective processes, density levels, and geometry variations. Advanced processing algorithms can be utilized to reduce false results and improve detection confidence. ICOS CI-T130 has a wide range of optional online functions to support complete inspection applications. These functions include mask registration, wafer mapping, in-situ preventative maintenance, process compensation, and wafer tracking. It also includes an optional high-performance image processing package that enhances data acquisition. Overall, TENCOR CI-T130 is a highly capable equipment for mask and wafer inspection. Its advanced features, powerful optics systems, and sophisticated algorithms represent the cutting-edge of technological innovations and create an ideal platform for manufacturers and test engineers. The system's flexibility, ease of use, and accuracy enable it to serve as the cornerstone of a complete semiconductor inspection solution.