Used KLA / TENCOR ILM 2367 #9024433 for sale

KLA / TENCOR ILM 2367 is a mask and wafer inspection equipment designed to enable semiconductor manufacturers to expedite production processes and improve yields. The system combines focused ion beam (FIB) lithography with advanced imaging technology to detect defects and structural integrity in each mask and wafer created during the production process. It is powered by a patented OptiFIBER™ imaging technology which employs multiple optical signal channels to obtain accurate 3D images of the scanned objects. KLA ILM 2367 utilizes an open, scalable architecture that is capable of multiple configurations ranging from a single wafer-focused FIB station to a fully customized unit with 12 wafer stations and two integrated FIB systems. This enables the machine to scan up to 1200 mask and wafer samples in under 10 minutes. A strong attention to detail was also given when developing the tool's sample positioning mechanism which allows for accurate and repeatable sample positions. In addition, an integrated FIB asset allows for local imaging with higher magnifications and longer observation times at different locations on the same sample. TENCOR ILM 2367 also comes with a user-friendly visualization interface for controlling imaging and specimen manipulation from any PC or laptop. This provides easy access to a variety of imaging quality and positioning parameters, which allows the operator to quickly customize and set parameters to achieve excellent results. In the inspection results, ILM 2367 is able to detect and classify defect types extremely quickly. It is capable of detecting particles, adhesion, and other contaminants down to the smallest levels. It also utilizes a 3D imaging mechanism to take accurate measurements of any curved surface and structures. Further, the model can detect spurs, topography variations, gateline resistance, and other microstructural features. KLA / TENCOR ILM 2367 also features several hardware and software modules for higher productivity and reliability. These include advanced data acquisition systems, nanopositioning stages, and a fast detection module for rapid fault analysis. Additionally, there is a powerful post-processing algorithm for image segmentation, defect detection, and classification. Finally, the equipment can work in your preferred host tools for easy integration into existing production lines. Overall, KLA ILM 2367 is a powerful mask and wafer inspection system that offers a reliable and accurate way to detect and classify various defects down to the sub-micron-scale. It features a fast and precise scan speed, excellent imaging capabilities, plus powerful hardware and software modules for increased productivity and efficiency. As such, this unit will help ensure higher yields and reduced waste materials in semiconductor production.