Used KLA / TENCOR INS 3000 #9358651 for sale

KLA / TENCOR INS 3000
ID: 9358651
Wafer Size: 8"
Vintage: 2001
Wafer defect inspection system, 8" 2001 vintage.
KLA / TENCOR INS 3000 is a mask and wafer inspection equipment designed for the semiconductor industry to provide rapid analysis and collection of data on device patterns and other detail features needing review. The system consists of four main subsystems, that includes the optical inspection unit, an image acquisition machine, an image and data processing tool, and a software package for data analysis. The optical inspection asset consists of a set of objective lenses and a dual wavelength laser diode which are used to inspect, analyze, and measure the top surface of the integrated circuit patterns. The infrared laser wavelength is used for improved resolution and the visible wavelength provides precision imaging of patterns on the chip surface. The image acquisition model acquires the digital images of the devices and patterns and stores them in digital format. The high-resolution imaging equipment is designed for high accuracy in capturing and storing detailed images of the patterns. The image and data processing system is used to analyze the data that has been acquired for analysis and processing. This unit typically includes hardware components such as CPU, image and pattern recognition systems, and digital signal processing systems. The software package contains application-specific software programs for high accuracy analysis and display of the device patterns and other detailed features. It includes software which can be customized to suit specific requirements. The software package also provides tools for data analysis and statistics. KLA INS 3000 provides an integrated environment for mask and wafer inspection. Its versatile design and advanced technologies offer high speed and accuracy in inspecting and analyzing device patterns and data. It is widely used in the semiconductor industry for a wide range of applications such as defect apprehension, device characterization, particle detection, registration measurement, and metrology.
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