Used KLA / TENCOR KLA2810 #9241188 for sale

KLA / TENCOR KLA2810 is a mask and wafer inspection equipment developed by KLA, which is used to detect defects in integrated circuit (IC) products. The system combines advanced image capture and analysis technology with innovative optics to provide accurate and repeatable defect inspection. KLA KLA2810 is based on TENCOR advanced "FastFoundry" architecture, which enables it to achieve high throughput with short inspection cycle times. This enables the unit to quickly detect errors in the manufacturing process and optimize downstream yield. TENCOR KLA2810 can inspect a wide variety of substrate sizes including wafers, masks and photomasks, with a range of resolutions from 0.1 micron to over 20 microns. It features an integrated, high-speed camera machine with 2K, 4K, and 5K pixel resolutions, coupled to a powerful image processing platform. KLA2810's software tools allow for quick and easy defect tuning and filtering. This enables the tool to detect a wide variety of defect patterns with high accuracy. Advanced defect detection algorithms, such as volumetric, color, grain noise, and resistivity, can be used to locate common patterns found during initial mask inspections. In addition, KLA / TENCOR KLA2810 can interface with external data sources and yield management systems, allowing for rapid and efficient analysis of production performance during diagnosis and resolution. KLA / TENCOR also offers a suite of defect classification options, which can help users determine the type of defect and its source in order to reduce downstream rework. In summary, KLA KLA2810 is a powerful, fast, and accurate mask and wafer inspection asset that can help manufacturers detect defects quickly and accurately. With its advanced image capture and analysis capabilities, along with its fast cycle times and advanced defect classification options, it can provide a time- and cost-efficient solution for addressing defect issues in integrated circuits.